Electrophoretic Deposition of TiO2 Thin Films for Photocatalytic Degradation of Organic Pollutants in Water

Authors

  • Francis W Nyongesa Department of Physics, University of Nairobi, P. O. Box 30197-00100, Nairobi, Kenya 2 Kenya Airways, P. O. Box 19002-00501, Nairobi, Kenya
  • Bernard O Aduda Department of Physics, University of Nairobi, P. O. Box 30197-00100, Nairobi, Kenya
  • Wilson G Nyaga Kenya Airways, P. O. Box 19002-00501, Nairobi, Kenya

Abstract

In this study, electrophoretic deposition (EPD) technique was used to deposit titanium dioxide
(TiO2) thin films on conducting glass substrates for application in photocatalytic degradation of
organic pollutants in water. Phenol was used as a model pollutant. The EPD suspension related
parameters and deposition conditions were first optimized for good quality film deposits. The
suspension stability and deposition conditions that result in good adherence of TiO 2 particles to the
substrate with homogeneous film coatings are ethanol, a TiO2 solid loading of 4 wt%, a 0.2 wt%
iodine concentration in the solvent and a deposition voltage of 20 V in a time of 3.5 minutes. The
photocatalytic activity of TiO2 thin films decreased exponentially with the ultraviolet light (UV)
illumination time and it was also dependent on film thickness, and sintering temperature of the
TiO2 thin films. Highest rate of photocatalytic activity was observed at an optimal film thickness
of 95 ± 2 µm sintered at 300 °C. The implications of these results are discussed for design of
inexpensive wastewater purification systems for light industries as well for semi urban small
communities.

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Published

2025-03-28

Issue

Vol. 44 No. 4 (2018)

Section

Articles